Used VACOS 1600/AF Sputtering Coating Machine Vacuum Coating Equipment

FACOS VACOS 1600 Coating Machine RF Sputtering Plating Machine
I. 1. Core Parameter Upgrades ‌Internal Chamber Dimensions‌: 1600mm×1200mm (3 times larger than the ZCL series), supports batch processing of large substrates (e.g., 1.5m×1m optical lenses) ‌Target Compatibility‌: 12 magnetron target positions (supports DC/Pulsed modes) + 4 electron beam evaporation sources, capable of simultaneous deposition of metal/compound multilayer films ‌Ultimate Vacuum‌: ≤5×10⁻⁴Pa (one order of magnitude better than conventional sputtering equipment), reduces film layer impurity defects
2. Process Breakthroughs ‌Composite Coating Technology‌: Magnetron sputtering (DC/Pulsed) and arc ion plating (ARC) operate synergistically, achieving TiAlN (hardness 2800HV)/SiNx (refractive index 2.1) gradient film layers ‌Intelligent Control System‌: Real-time film thickness monitoring (QCM accuracy ±0.1nm) Plasma diagnostics (OES can detect Ar⁺ concentration changes ±2%) 3. Typical Application Cases ‌Aerospace Components‌: Turbine blade CrAlY coating (thickness 50μm), temperature resistance up to 1200℃ (5 times longer lifespan than traditional coatings) ‌Optical Devices‌: AR coating (MgF₂/SiO₂ 7-layer stack), visible light transmittance increased to 99.2% (uncoated glass transmittance 92%)
II. Sputtering Coating Machine Technology Lineage
1. Industrial-Grade Equipment Representatives Model Key Indicators Industry Application AMAK Endura 300mm wafer, ±1% uniformity 7nm logic chip manufacturing LAM 2300 8 target positions, deposition rate 800nm/min OLED display panel production
2. Experimental Innovative Designs ‌RF Sputtering Mode‌: Can deposit insulating dielectrics (Al₂O₃ dielectric constant 8.4) ‌Unbalanced Magnetron Target‌: Ionization rate increased to 80% (traditional targets 30%), film layer density improved by 40%
III. Coating Technology Details
1. Electron Beam Evaporation Technology Breakthrough (Oxford VS5 Pro Upgrade) ‌Electron Beam Power‌: 15kW (original 6kW), evaporation rate increased by 2.5 times (e.g., gold film deposition rate reaches 120nm/min) ‌Film Thickness Control‌: ±1.5nm (10nm film layer), suitable for optical film interference control
2. Roll-to-Roll Coating Solution (Zhenhua RZW2000) ‌Substrate Width‌: 2100mm (supports wide-format PET/copper foil continuous coating) ‌Evaporation Boat Temperature‌: 1800℃±5℃ (ensures high melting point tungsten evaporation stability) ‌Production Capacity‌: 300m²/h (PET substrate), suitable for mass production of solar backsheet films